Extreme Ultraviolet (EUV) Lithography is a revolutionary new technology that will enable higher performing, energy efficient and cost-effective microchips to be mass produced.
Created by a team of skilled experts from ZEISS Semiconductor Manufacturing Technology, TRUMPF Lasersystems for Semiconductor Manufacturing and Fraunhofer Institute for Applied Optics and Precision Engineering, it has been developed over a 20-year period and is set to completely transform global digitalisation.
The initial research project entitled "EUV Lithography – New Light for the Digital Age" sought to reinvent the microchip. From the light source and the optical system in a mirror-filled vacuum through to the surface coating of the mirrors, the entire exposure technology was developed from scratch as part of the development process.
The team essentially created the world’s “most precise” mirror. A mirror so precise, it is said, that if a laser beam was directed onto its surface and then aimed at the moon, then that laser beam could still hit a target the size of a golf ball.
EUV technology is backed by more than 2,000 patents and is set to future-proof the digitalisation of our everyday lives ensuring that everything from artificial intelligence, state-of-the-art smartphones and automated driving applications could have this new, more powerful yet more cost effective technology at its heart.