Point and Edge dislocations in GaN compound semiconductor material, capturing using ECCI
Webinar

Viewing Defects in Compound Semiconductor Materials

with Electron Channelling Contrast Imaging
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Webinar Abstract

Join us for an in-depth exploration of Electron Channelling Contrast Imaging (ECCI), a powerful scanning electron microscopy technique that enables direct visualization of crystallographic defects in compound semiconductors. ECCI provides high-resolution, non-destructive insights into dislocations, stacking faults, and other structural imperfections that critically impact device performance.

This webinar will cover the principles behind ECCI, its advantages over conventional approaches, and practical applications in semiconductor research and manufacturing. Learn how this technique is transforming defect analysis for materials such as GaN, SiC, and other advanced compounds, paving the way for improved reliability and efficiency in next-generation electronic and optoelectronic devices.

Benefits of Attending

  • Gain understanding about the ECCI technique
  • Discover how ECCI can help with defect detection
  • Hear from an expert researcher how this is being put into practice  

Date: 5th May 2026
Time: 10:00 - 11:00 (GMT)

Dr. Naresh Gunasekar
Speaker Dr. Naresh Gunasekar Lecturer, University of Cardiff

Dr. Gunasekar specialises in fabrication and characterisation of optoelectronic devices, currently investigating technologies for manufacturing deep UV photodetectors and light emitters and developing multimodal microscopy workflows for reliability and failure analysis of compound semiconductor devices.

Dr. Andrew Elliott
Speaker Dr. Andrew Elliott Business Development Product and Applications specialist, Carl Zeiss Ltd.

Andrew Elliott is the Business Development and Applications Lead for the Electronics and Materials Science sectors at Carl Zeiss Ltd. He specialises in advanced imaging systems—including light microscopes, electron microscopes, and X‑ray CT—and in translating these technologies into effective failure‑analysis workflows. This expertise positions him well to contribute to the ongoing direction of the NMI Failure Analysis Working Group. Outside his role at ZEISS, Andrew holds a PhD in the metallurgy of gas‑turbine engine materials and a Master’s degree in Chemistry, both from the University of Leicester.

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